发明名称 HEAT PROCESSING DEVICE
摘要 <p>PURPOSE:To prevent the quality deterioration of an object to be processed by preventing at least the surface of a carrier placing table from being electrostatically charged. CONSTITUTION:An aluminum base 103 is firmly provided on a pair of columns 101, and an aluminum sub-base 105 is provided at an interval from the base 103. A plastic mounting table 107, which is electrostatical charge proof, is firmly adhered on the sub-base 105. Thus, the influence of static electricity on a wafer in a carrier 7 is eliminated even when the carrier 7 is mounted on a carrier placing table 8 by providing the mounting table 107 made of electrostatical charge proof plastic on the carrier placing table 8.</p>
申请公布号 JPH04196459(A) 申请公布日期 1992.07.16
申请号 JP19900327132 申请日期 1990.11.28
申请人 TOKYO ELECTRON SAGAMI LTD 发明人 ONO YUJI;IWAI HIROYUKI
分类号 C23C14/50;H01L21/205;H01L21/22;H01L21/31;H01L21/68 主分类号 C23C14/50
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