发明名称 SHOWER RINSING EQUIPMENT OF SUBSTRATE
摘要 PURPOSE:To obtain a shower rinsing equipment of a substrate wherein intensive deposit is eliminated by sufficiently utilizing physical effect of shower, and the re-attaching of resist particles which have been once exfoliated is prevented, by providing a conveying means which carries substrates with their forward ends higher than the rear, and shower nozzles which spout rinse liquid agaist the upper surface of the substrate. CONSTITUTION:A substrate 20 is carried by a conveying means 21. In a rinse treatment chamber 22, rinse liquid is spouted on the surface of the substrate 20, by shower nozzles 23 arranged in the upper part. Used rinse liquid is gathered in a waste liquor collecting tank from a waste liquor hole 26. As the conveying means 21, rollers are used. Along the direction of progress of the substrate 20 in the chamber 22, set positions of the rollers ascend gradually. In the rinse treatment chamber 22, the substrate 20 is inclined in such a manner that its forward end is higher than the rear. As the result, the rinse liquid 24 on the substrate surface flows from the part where rising is ended to the part where rising is not started, so that the rinse liquid does not flow into the part where rinsing is ended. Thereby resist particles which have been once exfolitated can be prevented from flowing into the part where rinsing is ended and re-attaching on the surface, and excellent rinsing is enabled.
申请公布号 JPH04196519(A) 申请公布日期 1992.07.16
申请号 JP19900332429 申请日期 1990.11.28
申请人 MATSUSHITA ELECTRIC IND CO LTD 发明人 AKUTAGAWA RYUTARO;INAMI TAKASHI;TSUDA YOSHIYUKI;YASUI HIDEAKI
分类号 G03F7/30;H01L21/027;H01L21/30 主分类号 G03F7/30
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