| 摘要 |
PURPOSE:To obtain a liquid treating method wherein air bubbles mixing in treating liquid to be supplied are eliminated and coating irregularities are prevented, by a method wherein, when a specified amount of liquid for treating an object to be treated is supplied via a filter, air is removed from the filter before the liquid passes the filter, and then the liquid is made to flow in the state that deserting is stopped. CONSTITUTION:Resist is sent from an accommodation vessel 13 to a liquid amount detector 11 through resist supply piping 12. The air permeating into the piping 12 between the vessel 13 and the detector 11 is introduced from the upper part of the detector 11 to piping 16 for deserting, and discharged into a drain vessel 23 via an air operating valve 22. The resist passes the piping 12 and progresses as far as a filter 10. The air permeating into the piping 12 between the detector 11 and the filter 10 is discharged from the filter. By the same operation, the air between the filter 10 and a filter 8 is discharged. In this manner, the air in the piping 12 are all eliminated, and the resist whose air bubbles are removed can be uniformly spread on a semiconductor wafer 2. |
