| 摘要 |
PURPOSE:To form an accurate pattern by sequentially moving a reticle to an element to repeat an exposing step plural times, and pattern-forming partially or all region of a repeated circuit pattern of the same shape. CONSTITUTION:First, only one pixel is exposed for an element coated with photoresist 107 by using a reticle 106, and a pattern of the reticles 106 of an exposed part 108 and a nonexposed part 110 is transferred only to the photoresist 107 on the first pixel 108. Then, the same reticle 106 used for the exposure on the pixel 108 is moved to be exposed to match a second pixel 111. Entirely the same gate pattern as the first pixel is transferred to the photoresist 107 on the second pixel 111. Thus, repeated circuit patterns of the same shape of high accuracy can be formed without depending upon the pattern size on the reticle, exposure wavelength. |
