| 摘要 |
PURPOSE:To prevent adhesion of waste developer to the rear of a substrate by inclining the upper surface of a current plate to the downward in the side of external circumference from the opening of pipe. CONSTITUTION:A water tank 15 which is formed circular to store the cleaning water, a current plate 16 formed circular to cover the upper part of the water tank 15 and a pipe 17 which is opened within the water tank 15 and at the upper surface of the current plate 16 to discharge the cleaning water toward the rear of a substrate 1 are provided. The water tank 15 is also provided with a drain port 15a to keep the water to the constant level by overflow of the cleaning water supplied continuously. The current plate 16 is positioned closely to the rear of the substrate 1 at the area in the vicinity of opening of pipe 17 in the upper surface and the external circumference thereof is inclined to the lower side from the opening of the pipe 17 at the upper surface. Therefore, the cleaning condition does not change during the cleaning of the rear, never causing insufficient cleaning or letting the cleaning water enter the front surface of substrate. Therefore, adhesion of the wasted developer to the rear of substrate 1 can be prevented. |
