| 摘要 |
<p>PURPOSE:To prevent generation of poor exposure even at positioning the etching part of a phase shifter in a light transmitting part by coatedly fitting a phase shifter on one part of a light transmitting part, and laminating a plurality of materials having different etching selection ratios to form the phase shifter. CONSTITUTION:A light intercepting film 3 openingly provided with a light transmitting part 4 so as to be a desired pattern is coatedly fitted on a base plate 2, a phase shifter 5 consisting of transparent substances against exposure light is coatedly fitted on at least one part of the light transmitting part 4, and the phase shifter 5 is formed by laminating a plurality of materials I, II having different etching selection ratios. Consequently, the edge parts of the phase shifter 5 positioned in the exposed pattern are step-likely formed, for example by setting the film thickness of respective layers so as to gradually shift the phases of exposure light transmitted through respective layers of (n) pieces by 180 deg./n, non-exposed territory is not generated inside the exposed pattern due to phase shift of 180 deg. at the edge parts. Hereby, generation of poor exposure can be prevented even in case of positioning the edge parts of the phase shifter 5 in the light transmitting part 4.</p> |
