发明名称 PLANER TYPE ION SENSOR
摘要 PURPOSE:To make easy constructing a sensor of integrated type and facilitate mounting for installation of a flow cell by forming separately a semiconductor base board and a base board for formation of ion sensitive film, and afterward consolidating them at mounting. CONSTITUTION:A polymide film 4 is formed through patterning process on a glass epoxy base board 2 provided with Cu wiring 1 on the surface of an ion sensor as object of this invention, and in the center of the patterned polyimide film an opening is formed to serve for formation of ion sensitive films 3. A plurality of sensitive films 3 are put separately as covering the wiring 1 in this opening part. The potential generated in the sensitive films 3 at measurement is conducted through a through hole 5 provided in the base board 2 to a plurality of FETs in a semiconductor chip 10 mounted on the rear of the base board 2. These FETs 9 are connected to an external measuring circuit through a drain 12 and a source 13. Thus the FETs 9 are protected perfectly from the measuring liquid by performing mounting to the surface opposite the sensitive films 3, and connection with the external measuring circuit can be made on the rear surface.
申请公布号 JPH04186153(A) 申请公布日期 1992.07.02
申请号 JP19900313889 申请日期 1990.11.21
申请人 HITACHI LTD 发明人 TSUKADA KEIJI;MIYAHARA YUJI;SHIBATA YASUHISA;WATANABE YOSHIO
分类号 G01N27/28;G01N27/414 主分类号 G01N27/28
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