CLEANING SYSTEM FOR WAFER,申请号JP19900314739-传众专利搜索

首页产品黄页商标征信

会员服务注册登录

法人/股东/高管

发明名称	CLEANING SYSTEM FOR WAFER
摘要
申请公布号	JPH04184927(A)	申请公布日期	1992.07.01
申请号	JP19900314739	申请日期	1990.11.20
申请人	HITACHI PLANT ENG & CONSTR CO LTD;OMI TADAHIRO;DAN KAGAKU:KK	发明人	HIRATSUKA YUTAKA;OMI TADAHIRO;HANAJIMA SHIGEHARU;KAMIMURA YASUO;WATANABE MITSUO
分类号	H01L21/677;H01L21/304;H01L21/68	主分类号	H01L21/677
代理机构		代理人
主权项
地址

您可能感兴趣的专利

Device for automatically cutting a seat belt following a pre-determined delay after a pre-determined tensioning of the belt.

Optical signal modulation device.

Black sintered body of aluminum nitride and process for producing the same.

Large thin ceramic pane.

Stripping compositions and their use for stripping resists from substrates.

Pallet for keeping articles available in a predetermined position.

Cardboard tray for pots.

Electromagnetic relay.

Device for repeatably setting the spatial position of a first object in relation to other objects with extreme accuracy.

Light duty metal structural frames.

PRETREATING AGENT FOR PERCUTANEOUS ADMINISTRATION.

NUMERICALLY CONTROLLED PUNCH PRESS.

Method for converting cyclic polycarbonate oligomer mixtures to linear polycarbonates, and compositions resulting therefrom.

Apparatus for measuring firmness.

Box for cultivating plant.

Assembly by welding of tube plates in heat exchangers comprising solid titanium tube plates.

Functionalized polyphenylene ethers, method of preparation, and polyphenylene ether-polyamide compositions prepared therefrom.

Holding device.

Aqueous ink composition.