| 摘要 |
The invention concerns a method of production of immersion photodetectors, according to which surface of base transparent for radiation in infrared band is accurately polished, characterised in that on polished surface of base (4, 5) transparent for radiation in infrared band is placed by means of epitaxy a layer of photosensitive HgSdTe (6), on which, following placing protective coating of photoresistance (7), is produced a set of detection structures (2), and then after cutting of that base (4, 5) into fragments, consisting of single detection units (2), are formed from them lenses (1).<IMAGE>
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