| 摘要 |
A method for producing new ditiane derivatives defined by the general formula 1, where m and n signify independently 0.1 or 2, R<1> stands for C2-C9-alkinyl which may possibly be substituted by C1-C4-alkoxyl or tri(C1-C4-alkyl)-silyl or 4 halogen atoms; C2-C10-alkenyl possibly substituted by 2, 3 or 4 halogen atoms; C4-C12-alkadienyltio group; C1-C10-alkyl possibly substituted by C2-C7-alkynyl, C1-C4-alkoxyl or C1-C4-alkyl-C3-C5-cycloalkyl, or hydroxyl and/or 2 or 3 halogen atoms; C3-C5-cycloalkyl substituted by 2 C1-C4-alkyls and 2 halogen atoms; C5-C7-cycloalkyl possibly substituted by C2-C8-alkynyl, C1-C5-alkoxycarbonyl or hydroxymethyl; pyridyl substituted by ethinyl or a halogen atom; phenyl substituted in positions 3,4 or 5 by 1-3 substituents selected from the group comprising: a halogen atom, C1-C4-halogenoalkyl, C1-C4-halogenoalkoxyl, C1-C4-halogenoalkyltio group, cyanic group, C2-C5-alkynyl possibly substituted by a substituent selected out of a halogen atom, C1-C4-alkylocarbonyloxyl, C1-C4-alkoxylcarbonyl, C1-C4-alkoxyl, tri(C1-C4-alkyl)-silyl or hydroxyl with a possibility of additional substitution in the positions 2 and/or 6 with a fluorine atom; R<1> does not stand for propyl or butyl and R<2> and R<3> stand independently for a hydrogen atom or methyl. The method is distinctive in that the compound defined by the general formula 2 where X stands for SH group and R<2> and R<3> signify as stated above, in the form of a ditiaborine complex with dimethyl sulphite is reacted with a carboxylic acid defined by the general formula 3.<IMAGE>
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