| 摘要 |
PURPOSE:To improve the accuracy of defect inspection by providing not only X, Y stages but theta stage with which a photomask can be rotated by 90 deg. on the inspecting device for defects of photomask. CONSTITUTION:The photomask 2 is fixed on a photomask holder 3 and scanned with X stage 6 and Y stage 7 for a microscope 1 (X-direction scanning) in order to inspect the whole surface of the photomask. Then the photomask holder 3 is rotated with a stage 4 by 90 deg. and again the whole surface of the mask 2 is inspected. This inspection after rotated by 90 deg. of the holder 3 is regarded as Y-direction scanning of the photomask 2. Thereby, such defects not detected by X-direction scanning only by conventional method can be all detected by this method. |
