发明名称 DETECTION METHOD OF VERY SMALL LEAK OF VACUUM; SEMICONDUCTOR VACUUM SUCTION APPARATUS
摘要 <p>PURPOSE:To effectively detect the very small leak of a vacuum by a method wherein a valve is shut, a vacuum chuck is shut off from a vacuum source, the vacuum level of a vacuum confined between a semiconductor, the vacuum chuck and the valve is detected and it is judged whether the vacuum level is dropped from a prescribed value. CONSTITUTION:A semiconductor 1 is put on a vacuum chuck 10; a valve 24 installed between a vacuum source 22 and the vacuum chuck 10 is opened; the vacuum level of a pipe passage connecting the vacuum chuck 10 to the valve 24 is detected. Then, it is judged whether the vacuum level of a pipe passage connecting the vacuum chuck 10 to the valve 24 is dropped from a prescribed value during a prescribed time since the valve 24 has been shut. Thereby, the very small leak of a vacuum is detected. Consequently, it is possible to detect the very small leak, of the vacuum between the vacuum chuck 10 and the semiconductor 1, which cannot be detected by using an ordinary vacuum gauge. Thereby, it is possible to effectively detect the very small leak of the vacuum.</p>
申请公布号 JPH04181752(A) 申请公布日期 1992.06.29
申请号 JP19900308640 申请日期 1990.11.16
申请人 FUJITSU LTD 发明人 USUI YOICHI;TAKAHASHI TAKAO
分类号 H01L21/683;G03F7/20;H01L21/027 主分类号 H01L21/683
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