| 摘要 |
<p>PURPOSE:To manufacture a throw-away total reflection prism with good profitability by working and forming a total reflection prism by photolithography technology. CONSTITUTION:A resist film composed of high polymer is formed on the surface of a silicon substrate 1, the surface of which is mirrorpolished, and the resist film is irradiated with light through a glass mask having a portion which does not transmit light to be patterned. After the substrate 1 is subjected to etching to make a through hole 2, the resist film is removed. Subsequently, when narrow bridges 3 are cut off, using the photolithography technology, a lot of throw-away attenuated total reflection prisms 5 having a liquid sample holding portion can be manufactured quickly, easily and with high profitability.</p> |
