| 摘要 |
PURPOSE:To obtain a positive type photoresist composition having excellent resolving power, sensitivity, heat resistance and developing properties, comprising a specific alkali-soluble novolak resin and a sensitized material consisting essentially of a 1,2-quinonediazide compound. CONSTITUTION:(A) 100 pts.wt. alkali-soluble novolak resin obtained by reacting a (substituted) phenol with an aldehyde in the presence of a silica magnesia- based solid catalyst [preferably MIZUKA LIFE P-1 manufactured by MIZUSAWA KAGAKU KOGYO KK] at 70-160 deg.C for 3-50 hours, having 2,000-30,000 weight-average molecular weight is blended with (B) 5-100 pts.wt., preferably 10-50 pts.wt. sensitized material consisting essentially of an ester of a 1,2-quinonediazido-5-(and/or -4-)sulfonic acid and a polyhydroxy aromatic compound to give a positive type photoresist composition for fine processing. |
