| 摘要 |
PURPOSE:To enable good observation in both parties and enable the highly accurate measurement of a base line by changing the wavelength region of the luminous flux for observing the surface of a wafer and the wavelength region of the luminous flux for observing the surface of an optical recording medium. CONSTITUTION:Out of the luminous fluxes from a lamp 14, the luminous flux in the specified wavelength region is selected by a filter changeover plate 16, and it passes an optical fiber 15 and enters an alignment scope 11. And when observing the wafer surface 4, where photoresist is applied, with an alignment scope 11, the luminous flux in the wavelength, where the photoresist does not sensitize substantially, is used. Moreover, when observing the optical recording medium surface (photochromic material face) 10, the luminous flux in such wavelength region as to overlap the spectrum absorbing curve after exposure of the photochromic material by a specified range is used. Hereby, both alignment marks can be well observed with the luminous fluxes in the optical wavelength region, and the base line can be sought with high accuracy. |
