发明名称 OPTICAL EXPOSING MASK AND MANUFACTURE THEREOF
摘要 PURPOSE:To secure such an optical exposing mast that is provided with a firm phase shifter being formed in a self-mating manner by installing the said phase shifter that is unsuperposed with a shading layer, covering at least one part of an opening of this ahding layer, and has the thick of changing the phase of exposing light to the opposite phase. CONSTITUTION:In this method, there are provided a shading film 2 subjected to patterning on a glass substrate 1 and a phase shifter 3 formed so as to cover one part of an opening 10 of this shading film 10 in a self-mating manner, while a part of exposing light transmitting this opening 10 of the shading film 2, and the phase is varied up to 180 deg. from 0 deg.. Accordingly, since each phase of light transmitted through the phase shifter 3 and that untransmitted become reversed in and around the shading film 2 in particular, light intensity at an end of the shading film 2 is checked, thus a substantial mask contrast is improved. With this constitution, such a phase shifter pattern as having durability and safety is securable in a self-mating manner.
申请公布号 JPH04177346(A) 申请公布日期 1992.06.24
申请号 JP19900306469 申请日期 1990.11.13
申请人 NEC CORP 发明人 HASEGAWA SHINYA
分类号 G03F1/30;G03F1/68;G03F1/80;H01L21/027 主分类号 G03F1/30
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