发明名称 PHOTOSENSITIVE RESIN COMPOSITION MATERIAL FOR COLOR FILTER
摘要 <p>PURPOSE:To obtain a color filter which has a short production process, can be developed with water, and has high precision and high durability by using novolak resin, a photo-active fusion restrainer, and an atomized pigment. CONSTITUTION:A photosensitive resin composition material is applied on a substrate made of glass with a spinner and the like, it is heated and dried to remove a solvent, a negative mask is put on a coating film on the substrate and radiated with light, it is treated with a developer containing an alkali agent to wash off the unhardened portion, and it is washed with water and dried to obtain a color filter. The photosensitive resin composition material for the color filter containing novolak resin, a photo-active fusion restrainer, an atomized pigment and the solvent is used. The atomized pigment is required to be used because high transparency is required for the resin component used for the color filter in particular. The process is shortened, development in water can be performed, high precision and excellent durability are obtained, and no acid is generated.</p>
申请公布号 JPH04175754(A) 申请公布日期 1992.06.23
申请号 JP19900302567 申请日期 1990.11.09
申请人 NIPPON KAYAKU CO LTD 发明人 SHIRASAKI YASUO;KATO YOSHINORI;FUKUNAGA MASANORI;KITAORI TOMOYUKI
分类号 G03F7/023;G02B5/20 主分类号 G03F7/023
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