| 摘要 |
PURPOSE:To provide a mask protecting member which prevents dust produced after installation from being moved, prevents patterns from being impaired by dust, and also reduce exchanging a pellicle frame and a pellicle membrane in number by applying pressure sensitive adhesives onto the pellicle frame and the inner surface of the pellicle membrane. CONSTITUTION:A device is made up of a frame body (a pellicle frame 3) protecting a photo mask (a reticle 2), and of a transparent membrane (a pellicle membrane 4), and the frame body 3 and a surface faced to the photo mask 2 of the transparent membrane 4 are constituted to be coated with pressure sensitive adhesives. In this constitution, dust 6 attached onto the inner surface of a mask protection member will never be moved onto the reticle 2 because dust is fixed onto pressure sensitive adhesives 5. |
