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发明名称
POSITIVE PHOTORESIST COMPOSITION CONTAINING ALKALI-SOLUBLE RESIN AND O-QUINONE DIAZIDE SULFONIC ACID ESTER
摘要
申请公布号
US5124228(A)
申请公布日期
1992.06.23
申请号
US19890381298
申请日期
1989.07.18
申请人
SUMITOMO CHEMICAL CO., LTD.
发明人
UETANI, YASUNORI;HANABATA, MAKOTO;NAKANISHI, HIROTOSHI;KUWANA, KOJI;OI, FUMIO
分类号
G03F7/022
主分类号
G03F7/022
代理机构
代理人
主权项
地址
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