| 摘要 |
PURPOSE:To simplify a defect inspection and mask manufacture by providing only patterns of a transparent thin film in practically transmission-illuminated regions on a mask. CONSTITUTION:The transmission-illuminated region of a mask 3 is constituted of a substrate 1 and patterns made of a transparent thin film 2, a light transmission region 3a is provided with the transparent thin film 2, and a light transmission region 3c is removed with the transparent thin film 2. Regions 3b, 3d are provided with multiple patterns of the transparent thin film 2 with a fine size unresolvable by a projection/exposure device used. The portion of the pattern formed with the transparent thin film 2 and having the size smaller than the resolution limit of a pattern transfer device is not transferred through the pattern transfer device, and it apparently functions as a shade region. A light transmission section can form an image with the pattern made of the transparent thin film 2. Pattern formation is facilitated, and a defect inspection is facilitated. |
