| 摘要 |
The method for forming contact windows into the nonconducting layers in different heights comprises the steps of sequentially forming a first nonconducting steps of sequentially forming a first nonconducting layer (2) and a second conducting layer (3) on a first conducting layer (1), etching a predetermined portion of the second conducting layer to form a second nonconducting layer (4) thereon, forming a photoresist (5) for a mask of contact window and apply a second photoresist (7) thereon, removing a predetermined region of the second photoresist for forming a contact window, sequentially etching the second and first nonconducting layers by using the photoresists as mask, removing the second photoresist to etch the exposed first and second nonconducting layers by using the first photoresist as a mask to form a contact window with uniform width and removing the first photoresist to form a third conducting layer (6) thereon, thereby minimizing the contact failure.
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