PRESSURE CONTROL METHOD AND APPARATUS OF MULTI-REACTION FURNACE FOR SEMICONDUCTOR MANUFACTURING APPARATUS

摘要

The apparatus includes a plurality of pressure sensors (PS1- PS5) for detecting the pressures of the respective reactors to convert them into voltage signals. A power supplying and reading circuit supplies power to the pressure sensors (PS1-PS5), and vacuum valves (V1-V5) are connected to the respective reaction chambers. A throttle valve adjusts the pressure of the reaction chambers, and a vacuum pump produces vacuum within discharge tubes, while an interface board transmits and receives analogue signals representing the pressures of the chambers, to transmit the signals between the power supplying and reading circuit and a throttle valve controller.