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发明名称
FORMING METHOD FOR CONTACT HOLE IN SEMICONDUCTOR DEVICE
摘要
申请公布号
JPH04174518(A)
申请公布日期
1992.06.22
申请号
JP19900302224
申请日期
1990.11.07
申请人
NEC CORP
发明人
KITAJIMA HIROSHI
分类号
H01L21/28;H01L21/302;H01L21/3065;H01L21/768
主分类号
H01L21/28
代理机构
代理人
主权项
地址
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