VAPOR GROWTH METHOD OF SEMICONDUCTOR,申请号JP19900299471-传众专利搜索

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发明名称	VAPOR GROWTH METHOD OF SEMICONDUCTOR
摘要
申请公布号	JPH04171812(A)	申请公布日期	1992.06.19
申请号	JP19900299471	申请日期	1990.11.05
申请人	FUJITSU LTD	发明人	ITO HIROMI
分类号	H01L21/205	主分类号	H01L21/205
代理机构		代理人
主权项
地址

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