发明名称 STRUCTURE OF SEMICONDUCTOR DEVICE
摘要 PURPOSE:To lower unnecessary radiation to a low level and, at the same time, to prevent the occurrence of malfunctions by providing a film of the same material as that of a wiring pattern on the wiring pattern forming surface, at a portion except the wiring pattern, of an insulating substrate facing the active element forming surface of a semiconductor element. CONSTITUTION:A wiring pattern 2 is formed on a substrate 1 so that part of the pattern 2 can face metallic projections 3 and the projections 3 electrically connect electrodes on a semiconductor element 6 to the pattern 2 on the substrate 1. An insulating resin 5 has such a property that the resin 5 is hardened or becomes to have an adhesive strength when the resin 5 is subject to external energy, such as light, etc., and when the projections 3 on the element 6 are pressed against the pattern 2 on the substrate 1, the resin put between them is pushed out and the projections 3 are electrically connected to the pattern 2. When the resin 5 is pushed out, the external energy is applied to the resin 5. At the same time, an electromagnetic shield film 7 is formed of the same material as that of at least one layer of the pattern 2.
申请公布号 JPH04171951(A) 申请公布日期 1992.06.19
申请号 JP19900300887 申请日期 1990.11.06
申请人 SEIKO EPSON CORP 发明人 HASHIMOTO NOBUAKI
分类号 H01L21/60;H01L27/12 主分类号 H01L21/60
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