发明名称 Devices based on Si/Ge.
摘要 <p>High speed transistor devices for use in high speed circuitry such as laser driver circuitry are formed by utilizing a high temperature deposition process. For example, chemical vapor deposition performed at temperatures on the order of 900 DEG C for deposition of Si/Ge materials leads to bipolar devices having excellent properties. In particular, such devices are mechanically stable and are relatively defect free.</p>
申请公布号 EP0490531(A2) 申请公布日期 1992.06.17
申请号 EP19910311018 申请日期 1991.11.28
申请人 AMERICAN TELEPHONE AND TELEGRAPH COMPANY 发明人 BRASEN, DANIEL;FELDMAN, LEONARD CECIL;GREEN, MARTIN LAURENCE;WEIR, BONNIE ELAINE
分类号 C30B25/00;C30B29/00;H01L21/205;H01L21/331;H01L29/16;H01L29/73;H01L29/737;H01L29/76;H01L29/772 主分类号 C30B25/00
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