| 摘要 |
PURPOSE:To contrive the improvement of X-ray reflectance, the enlargement of available wave length range and the improvement of environment-proof performance by mutually making a laminated structure of a plurality of pairs of the layers having reflection characteristics in the range of X-rays wave length of 10 to 200Angstrom and other pairs of the layers composed of metal materials. CONSTITUTION:An X-ray reflector is made, for example, the molecular beam epitaxial method, the sputtering method and the like. The formation range of the layers is controlled with the use of a shutter or by moving a board 1 for a material source. At first, for example, a beryllium oxide layer 2 is formed on the board 1 with the use of the vacuum deposition method. Next a metal layer 3 (for example, Cr, Fe, Co and Ni) is formed thereon to make a pair of the layers 4 by the use of the layers 2, 3. This pair of the layers 4 are laminated by predetermined number of layers by the same method to constitute the reflector. The incident beam 11 of X-rays is reflected on each pair of the layers 4 of the reflector to become a reflected beam 12.
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