Aq. developer for positive or negative resist - contg. tetra:alkyl:ammonium hydroxide, alkanolamine and diol ether or ester

摘要

An aq. developer soln. contg. basic organic cpds., for positive or negative photoresists with a binder (mxt.) insol. in water and soluble in aq. alkaline solns., and an onium salt, contains (a) 0.5-10 wt.% of a tetraalkylammonium hydroxide of formula (I), (b) 1-20% of an amine of formula R5R6N-CH2CH2-OH (II) and (c) 0.01-5% of a cpd. of formula (III), R1, R2, R3, R4 = 1-4C alkyl or hydroxyalkyl and 1 of these may = benzyl, R5, R6 = 1-3C alkyl or 2-3C hydroxyalkyl, R7, R8 - 1-3C alkyl or 2-3C acyl. The pH of the developer soln. is 10-14.5. Cpd. (III) is pref. methoxypropyl-2-acetate. The soln. is used to develop, after image-wise irradiation, (A) a negative resist in which the radiation-sensitive layer contains a mixt. of a polymer with phenolic OH gps., an onium cpd., and an organic cpd. which is acid-crosslinkable with phenols or (B) a positive resist in which the radiation-sensitive layer contains a polymer with phenolic OH gps., where the phenolic OH gps. have been partly replaced by OR gps. and an onium salt, R = acid-labile gp. ADVANTAGE - The developer does not attack the unexposed resist or typical substrate surfaces, e.g. evaporated Al, has adequate storage stability, contains no metal ions, can be completely removed after development, suppresses the surface peeling effect and gives high contrast, and high resolution in the sub-micron range, with clean structures with sharp edges.