| 摘要 |
<p>PURPOSE:To obtain elements in a simple process by forming a gate material layer and a resist layer on an insulation layer, and forming an opening hole through the etching of the gate material layer and the insulation layer so as to form an electrode and remove the resist. CONSTITUTION:An insulation layer 2, a gate material layer 3 and a resist layer 4 are formed on a substrate 1, the layer 2 and the layer 3, respectively. The patterning of the layer 4 forms a resist opening 42 having a overhang part 40, and the etching of the layers 3 and 2 forms an opening hole 21, and the vapor-depositing of an electrode material in the opening hole 21 forms an electrode 5. After that, the removing of a resist 41 obtains a field emission type element. The manufacture thus is so easy that, when a field emission type display is manufactured by using the elements for picture elements, the picture elements are each manufactured in a simple process and the surfaces are easily manufactured uniform.</p> |
