RESIST COMPOSITION AND FORMATION OF RESIST PATTERN

摘要

PURPOSE:To obtain a positive resist for ionizing radiation which is excellent in sensitivity and resolution and which can be alkali developed by forming a resist composition which consists of an alkali-soluble base resin and an axid generator which contains more than one kind of halogen substituent in its structural formula and a specific substituent. CONSTITUTION:An acid generator containing more than one kind of halogen substituent in its structural formula and a substituent indicated by -OCOC R1R2R3 or -COOC R1R2R3 has the effect of sufficiently inhibiting dissolution against alkali developers. When a resist prepared by addition of the dissolution- inhibiting acid generator to an alkali-soluble resin is exposed to ionizing radiation, halogen atoms are removed in radical form from a substituent containing halogen and hydrogen atoms are taken out of a remaining solvent so that the dissolution-inhibiting acid generator of an exposure portion is converted to hydrogen halide. The hydrogen halide in turn attracks the substituent indicated by -OCOC R1R2R3 or -COOC R1R2R3. As a result, COC R1R2R3 or COOC R1R2R3 in these substituents are removed by hydrolysis and converted to hydroxide groups and then polarity is greatly varied and a resist pattern of a positive acid can be obtained.