Coating substrate with silicon di:oxide - in which multicomponent target in evacuated chamber contg. argon@ and oxygen@ is used

摘要

A process and appts. for coating a substrate (1), e.g. with SiO2, are described in DE4025231, having a current source (10) connected to a cathode (5) enclosing magnets (7,8,9) arranged in an evacuated chamber (15,15a). In this patent of addn. the multicomponent target (35) comprises a cylindrical middle part (35a) made of a material (e.g. Si) with a high affinity to reactive gas and two cylindrical outer parts (35b) connected in the axial direction to the back end of the middle part (35a) and is made of a material (e.g. Sn) with a low affinity to reactive gas. The reaction gas used is e.g. Ar and O2. USE/ADVANTAGE - The layer properties of oxidic or metallic thin layers can be modified.