发明名称 RADIOSENSITIVE COMPOUND AND FORMATION OF PATTERN USING SAME
摘要 PURPOSE:To realize provision of radiosensitive compound excellent in heat stability, and having high sensitivity and high resolution by allowing alkaline soluble polymer compound and carbon directly coupled to aromatic ring to include secondary or tertiary alcohol having hydroxyl group and precursor acid generating acid by application of radiation. CONSTITUTION:Secondary or tertiary alcohol having hydroxyl group and precursor acid generating acid by application of radiation are included in alkaline soluble polymer compound and carbon directly coupled to aromatic ring. The secondary or tertiary alcohol having hydroxyl group in the carbon directly coupled to the contained aromatic ring effectively takes dehydrating action when it is heated under strong acid to generate lipophilic compound. Since the hydrating action is induced by the acid generated from the precursor acid in a radiation application range when heating is carried out especially after application of radiation, unsoluble or slightly soluble characteristic to alkaline developing liquid is obtained. This radiosensitive compound serves as a negative type photosensitive compound. It is thus possible to have excellent sensitivity and stability against ultraviolet ray, electron beam, another radiation.
申请公布号 JPH04165359(A) 申请公布日期 1992.06.11
申请号 JP19900290917 申请日期 1990.10.30
申请人 HITACHI LTD;HITACHI CHEM CO LTD 发明人 UCHINO MASAICHI;HAYASHI NOBUAKI;TADANO KEIKO;IWAYAGI TAKAO
分类号 G03F7/004;G03F7/038;G03F7/38;H01B13/00;H01L21/027 主分类号 G03F7/004
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