发明名称 Sputtering equipment for coating large substrates with ferromagnetic and non-magnetic material - has cathode target comprising sub-targets, and cooling plates contg. magnet unit and poles shoes
摘要 Sputtering equipment for coating large substrates with ferromagnetic and non-ferromagnetic material has a cathode target (1), consisting of at least two sub targets (1',1''), electrically isolated from each other and supplied with any desired voltages. A cooling plate (2) is constructed like the target from at least two sub-cooling plates (2',2''). The cooling plate contains magnet units (5) with pole shoes (4) such that the gap between sub targets and sub cooling plates is in the region of a pole. The distance between a sub target and the associated magnet unit can be independently varied by relative mechanical movement. ADVANTAGE - At least two materials can be simultaneously or successively deposited on a substrate.
申请公布号 DE4127261(C1) 申请公布日期 1992.06.04
申请号 DE19914127261 申请日期 1991.08.17
申请人 FORSCHUNGSGESELLSCHAFT FUER ELEKTRONENSTRAHL- UND PLASMATECHNIK MBH, O-8051 DRESDEN, DE 发明人 FRACH, PETER, DR., O-8051 DRESDEN, DE;HEISIG, ULLRICH, DR., O-8052 DRESDEN, DE;LIEBERGELD, HORST, O-8054 DRESDEN, DE;HOLFELD, ANDREAS, DR., O-8027 DRESDEN, DE;WINKLER, TORSTEN, O-8060 DRESDEN, DE
分类号 C23C14/34;H01J37/34 主分类号 C23C14/34
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