| 摘要 |
PURPOSE:To obtain a reflection preventing film having high adhesion to synthetic resin, high productivity and no deterioration of the adhesion of the film after a humidity test by depositing SiO and a mixture of SiO and CeO2 over four layers by the electron beam heat deposition method. CONSTITUTION:For the first layer provided on the surface of a synthetic resin substrate, a mixture of CeO2 and SiO is deposited by the electron beam heat deposition method. The content of SiO is set to 5-30wt.% so that SiO is sufficiently oxidized by much O2 gas discharged from CeO2 at the time of deposition, the adhesion to the SiO2 of the second layer and the filling factor of a mixture layer are increased because of the contained SiO, and the moisture resistance is improved. For the second layer SiO2 is deposited by the electron beam heat deposition method to form a reflection preventing film. For the third layer, ZrO2, TiO2, Ta2O5 or a mixture of them is deposited by the electron beam heat deposition method. These mixture layers have a high refraction factor to improve the reflection preventing effect. The fourth layer constitutes the uppermost layer of the reflection preventing films, and SiO2 is deposited by the electron beam heat deposition method. SiO2 constitutes the reflection preventing film and functions to protect the surface. |
