Structurised semiconductor device has different doped Si monocrystal semiconductor zones bounded by barrier zone(s). The novel features are that: (a) there is a SiO2 film on at least one Si monocrystalline semiconductor zone, the thickness of this film being such that it can be removed easily down to the Si monocrystal by a low energy method; (b) Si is deposited on the SiO2 film and Si monocrystalline semiconductor zone exposed by the action of energy; and (c) a barrier zone consisting (partly) of polycrystalline Si is deposited on the SiO2 film.
申请公布号
DE3685020(D1)
申请公布日期
1992.05.27
申请号
DE19863685020
申请日期
1986.12.10
申请人
LICENTIA PATENT-VERWALTUNGS-GMBH, 6000 FRANKFURT, DE
发明人
KASPER, DR. RER. NAT., ERICH, W-7914 PFAFFENHOFEN, DE