Electrostatic chuck.

摘要

An electrostatic chuck for electrostatically holding a wafer (1) is provided in a vacuum chamber (10) formed in a magnetron plasma etching apparatus. The electrostatic chuck has a base member (21), a first insulating layer (41) provided on the base member and made of polyimide, a second insulation layer (42) made of A l N, a conductive sheet (44) provided between first and second insulation layers (41, 42), and an adhesive layer (43) made of a thermosetting resin and adhering the first insulating layer (41) to the second insulating layer (42). The wafer is placed on the second insulating layer (42), and power is supplied from a high voltage power supply (24) to the conductive sheet (44) via a feeding sheet (22), thereby creating static electricity and hence a coulombic force for holding the wafer (1) on the second insulating layer (42).