发明名称 PROCESSING METHOD FOR MASK PATTERN DATA
摘要 PURPOSE:To form an alignment mark at a specific position by giving priority to the area frame of the alignment mark and excluding the part of the area frame of a cover area which coverlaps with the area frame of the alignment mark when the area frame of the alignment mark and the area frame of the cover area overlap with each other. CONSTITUTION:It is confirmed first whether or not the area frame 5 of the alignment mark and the area frame 6 of the cover area 3 overlap with each other. When the area frame 5 and area frame 6 overlap with each other, the area frame 5 of the alignment mark 4 is given priority and the part of the area frame 6 of the cover area 3 which overlaps with the area frame 5 of the alignment mark 4 is excluded. Consequently, even when the alignment mark 3 and cover area 3 of data overlap with each other, the alignment mark can be formed at the specific position.
申请公布号 JPH04153650(A) 申请公布日期 1992.05.27
申请号 JP19900278242 申请日期 1990.10.17
申请人 FUJITSU LTD 发明人 ITATSU TOSHIHIKO
分类号 G03F1/68;G03F7/20;H01L21/027 主分类号 G03F1/68
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