PLASMA TREATING METHOD AND DEVICE,申请号JP19900276671-传众专利搜索

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发明名称	PLASMA TREATING METHOD AND DEVICE
摘要
申请公布号	JPH04154966(A)	申请公布日期	1992.05.27
申请号	JP19900276671	申请日期	1990.10.16
申请人	HITACHI LTD;HITACHI TOKYO ELECTRON CO LTD	发明人	NISHIJIMA HIKARI;ICHIKI SATOSHI;KIGA TOSHIO
分类号	C23C14/35;H01L21/203;H01L21/285;H01L21/31	主分类号	C23C14/35
代理机构		代理人
主权项
地址

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