DEVICE FOR CONTROLLING BEAMS OF PARTICLES, X-RAY AND GAMMA QUANTA AND USES THEREOF

摘要

An X-ray lithography device which utilizes a Kumakhov lens is disclosed. This device is capable of using both small area sources and synchrotron sources. This device provides improved X-ray control, precision and accuracy. Also provided is a method of X-ray lithograph which incorporates a Kumakhov lens.