发明名称 MASK/WAFER GAP DETECTING DEVICE FOR ALIGNER
摘要 PURPOSE:To enable the highly accurate detection of a gap between a mask and a wafer with low-priced structure by providing a squarer for squaring the photoelectric output signal of a detector, and a low-pass filter for extracting only the basic wave from the output of the squarer. CONSTITUTION:When a monochromatic and coherent light such as He-Ne laser is incident on a mask 10 with diffraction grating, two interference waves are generated by diffraction, and the amplitude of the composite wave is changed by a gap between the mask 10 and a wafer 20. However, when the gap between the mask 10 and the wafer 20 is vibrated minutely by a high frequency vibrator such as a piezoelectric element either from the mask 10 side or from the wafer 20 side and the quantity of light detected by a detector 7 is squared (8) and further let pass a low pass filter 9, only the signal of an envelope, that is to be the basic wave, can be extracted. The change by the gap can be thereby detected with low-priced structure compared to the case of dealing with the amplitude of the composite wave.
申请公布号 JPH04152204(A) 申请公布日期 1992.05.26
申请号 JP19900275358 申请日期 1990.10.16
申请人 ISHIKAWAJIMA HARIMA HEAVY IND CO LTD 发明人 ONO TOSHITAKA;NAKAJIMA TAKURO;TSUCHIYA YOJI
分类号 G01B11/14;G03F7/20;H01L21/027 主分类号 G01B11/14
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