| 摘要 |
PURPOSE:To stably form always good films by dissolving specific compds. into alkyl ester pyruvate. CONSTITUTION:Org. high-polymer compds., such as phenol and m-cresol, and radiation sensitive compds., such as azide compd. and diazonium compd., which induce a crosslinking reaction and make irradiated parts insoluble in a developer when irradiated with radiations, such as UV rays, far UV rays, electron rays, and X-rays, are dissolved in the alkyl ester pyruvate. The mol.wt. is preferably in a 2000 to 20000, more preferably 5000 to 15000 range when a novolak resin is used as the org. high-polymer compd. and the mol.wt. is preferably in a 10000 to 500000, more preferably 30000 to 100000 range when an acrylic copolymer is used. The content of the radiation sensitive compd. is preferably 10 to 20wt.% of the weight of the org. high-polymer compd. The good thick films are formed stably if the films are formed in such a manner. |
