| 发明名称 |
CLEANING OF APPARATUS FOR LIQUID-PHASE OXIDATION |
| 摘要 |
Composition for cleaning equipment used in a liquid phase oxidation process comprising an aqueous solution of between 3 and 30 %mass of a salt of sulphurous acid, between 0.5 and 30 %mass of a chelating agent and between 0.05 and 5 %mass of a cationic surfactant. |
| 申请公布号 |
JPH04145199(A) |
申请公布日期 |
1992.05.19 |
| 申请号 |
JP19900415515 |
申请日期 |
1990.12.28 |
| 申请人 |
SHELL INTERNATL RES MAATSCHAPPIJ BV |
发明人 |
DEBUITSUDO FUREDERITSUKU BOUMAN |
| 分类号 |
C11D10/02;C11D1/62;C11D3/02;C11D3/33 |
主分类号 |
C11D10/02 |
| 代理机构 |
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