| 摘要 |
Control method and apparatus for positioning an X-ray stage which is movable in X and Y directions to move a semiconductor wafer, for example, in a stepper wherein a pattern formed in the mask is sequentially printed on the shot areas of a semiconductor wafer in a step-and-repeat manner. The X-Y stage is provided with a wafer chuck supported by means of a tilting stage to control the tilting of the wafer chuck relative to the X-Y plane. In order to detect the position of the wafer chuck in the X and Y directions, the inclination of a laser interferometer mirror provided integrally with the wafer chuck relative to the X-Y plane can be detected. By this, when a positioning error for the X-Y stage occurs due to the Abbe length, in the Z direction, between the wafer supporting surface of the wafer chuck and the point in the mirror at which the laser beam from the laser interferometer is incident and due to the pitching and rolling of the X-Y stage, the error is detected on the basis of the attitude change by the movement of the X-Y stage, and is corrected.
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