| 摘要 |
PURPOSE:To obtain the photosensitive compsn. which has a high sensitivity and can form fine resist patterns even when light of a near UV region is used as a light source by incorporating an alkali-soluble resin and specific silyl ketone into this compsn. CONSTITUTION:This compsn. contains the alkali-soluble resin and at least one kind of the silyl ketone expressed by formula I and the silyl ketone expressed by formula II. In the formulas I and II, R1 denotes a hydrogen atom, 1 to 10C unsubstd. or substd. alkyl group, 6 to 14C unsubstd. or substd. aryl group; R2 to R7 may be the same or different and respectively denote a hydrogen atom, 1 to 10C unsubstd. or substd. alkyl group, 6 to 14C unsubstd. or substd. aryl group, silyl group; n is 1 to 8 integer. A sensitizer, dye surfactant, and a polymer for reforming coated films, etc., may be compounded in addition to the alkali- soluble resin and the silyl ketone with this compsn. |
