AUTOMATIC DEVELOPING DEVICE FOR PHOTORESIST

摘要

PURPOSE:To stably control development by providing transparent protection films which are confronted on a photoresist master disk at a prescribed interval in parallel and permitting laser light for monitor to pass through liquid held in a gap between the surface of the photoresist master disk and the transparent protection boards. CONSTITUTION:The transparent protection board 8 is arranged in parallel to the surface of the photoresist master disk 1 in a position where laser light for monitor 5 passes through and on the surface of a side where photoresist is applied in the photoresist master disk 1 at the interval of the prescribed gap 7. Unevenness in the direction of the thickness of development flowing on the surface of the photoresist master disk 1 is smoothed at the time of passing through the gap 7 between the surface of the photoresist master disk and the transparent protection board 8, and it comes to the developer layer whose thickness is mean. The transparent protection board 10 in the same structure is provided for a laser optical path for monitor on the back side of the photoresist master disk 1 and it comes to the liquid layer having the same mean thickness as the surface of the photoresist master disk by continuously injecting liquid to the gap. Thus, the fluctuation of laser beam for monitor which is made incident on the detector can be prevented and stable development control can be realized.