Deposition apparatus for growing a material with reduced hazard.

摘要

An apparatus for growing a material comprises a reaction vessel (1) of a metal extending generally in a vertical direction, the reaction vessel forming a reaction chamber (1a) therein, a cooling system (8) provided on said reaction vessel to maintain the reaction vessel at a temperature that the metal forming the reaction vessel does not cause contamination, an inlet (4) provided on the reaction vessel for introducing a reactant gas, an outlet (5) provided on the reaction vessel for exhausting a product gas that is formed in the reaction chamber, a support mechanism (3) at the bottom part of the reaction chamber to seal the reaction chamber, wherein the support mechanism has a rod member (3) extending vertically in said reaction chamber to hold thereon a susceptor (2) that is adapted to hold a wafer (10) on which the material is to be grown. Further there is provided a sleeve member (9) of a stable material particularly at a temperature that is used for growing the material, such that the sleeve member is provided in the reaction chamber along the inner surface. <IMAGE>