| 摘要 |
<p>PURPOSE:To decrease the stages for production of the photomask for phase shifting by respectively forming sloped parts and flat parts on the main surface of a glass substrate and setting the inclination angle of the sloped parts at the critical angle of exposing light or above. CONSTITUTION:The flat parts 3 and the sloped parts 2 are formed on the main surface of the glass substrate and the inclination angle theta1 above the critical angle of the exposing light is imparted to the sloped parts 2. Namely, the inclination angle theta1 of the sloped parts 2 are set at the critical angel of the exposing light or above, by which the exposing light entering from the direction perpendicular to the main surface of the glass substrate 1 is totally reflected in the sloped parts 2 and is advances rectlinear in the flat parts 3. Then, the sloped parts 2 are substantially light shielding regions and the flat parts 3 are transmission regions and, therefore, the photomask having the exposed regions and the transmission regions is obtd. even if an exposing film is not formed on the main surface of the glass substrate. The photomask for phase shifting is inexpensively produced in this way.</p> |
