EXPOSURE CONTROL SYSTEM FOR FULL FIELD PHOTOLITHOGRAPHY USING PULSED SOURCES

摘要

MI-3741 EXPOSURE CONTROL SYSTEM FOR FULL FIELD PHOTOLITHOGRAPHY USING PULSED SOURCES A photolithography exposure control system tolerant of noisy pulsed light sources having a controllable variable attenuator. A detector monitors the exposure dose of a light pulse enabling a controller to trigger another light pulse, when a predetermined attenuator is positioned in its path. A high degree of exposure control is achieved with a minimum number of light pulses or shots.