发明名称 NEGATIVE TYPE RADIATION SENSITIVE RESIST COMPOSITION
摘要 PURPOSE:To improve the resolution of a resist and profile shape and to lower a dimensional change rate by using a compsn. contg. a specific hydroxystyrene polymer. CONSTITUTION:The hydroxystyrene polymer having the unit of formula I and the unit of formula II as its constituting units, a triazine compd. and alkoxymethylated amino resin (B) are incorporated into this compsn. In the formula, Y denotes the group of formula III or IV; R<1> to R<3> respectively denote hydrogen, halogen, etc.; A denotes -SO2 or -CO-. The above-mentioned polymer is formed by dropping a soln. prepd. by dissolving, for example, poly(4- hydroxystyrene) and p-acetoaminobenzenesulfonyl chloride in dimethyl acetoamide, then dissolving the triethylamine into methyl acetoamide to effect reaction.
申请公布号 JPH04136859(A) 申请公布日期 1992.05.11
申请号 JP19900257172 申请日期 1990.09.28
申请人 TOKYO OHKA KOGYO CO LTD 发明人 TAKEDA YASUYUKI;TANAKA HATSUYUKI;OBARA HIDEKATSU;NAKAYAMA TOSHIMASA
分类号 G03F7/038;G03F7/004;H01L21/027;H01L21/30 主分类号 G03F7/038
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