| 摘要 |
<p>PURPOSE:To enhance coating performance, developability, and plating elutability resistance of the resist by specifying the resist composition. CONSTITUTION:This resist composition comprises (A) a multi-functional unsatu rated compound solid at room temperature, such as a diallyl phthalate prepolymer, (B) a multifunctional unsaturated compound liquid at room tempera ture, preferably, such as multifunctonal acrylate or methacrylate, (C) a photopoly merization initiator, an epoxy resin, and its hardener, preferably, such as an imidazole derivative, and (D) a melamine resin or its derivative, preferably, such as a compound having as diaminotriazine structure and a solubility in water of <=1wt.%.</p> |
